Veeco 的離子束蝕刻技術達成 100,000 柵極分秒無誤運作的里程碑
2014 年 12 月 11 日
Plainview, N.Y., December 11, 2014 – Veeco Instruments Inc.(Nasdaq:VECO) announced today that its NEXUS® Ion Beam Etch (IBE) system has achieved 100,000 operating minutes without failure during commercial production operation. This milestone demonstrates a fivefold increase in grid life, significantly improving total cost of ownership and reducing tool downtime.
The Veeco NEXUS IBE systems are used for many applications including the process of precisely etching metallic films to create the magnetic sensors used for a wide variety of mobile, automotive, MRAM, and hard disk drive devices.
“With this improved longevity, our customers do not need to perform preventive maintenance as frequently, resulting in increased tool utilization and decreased operating cost,” commented Tim Pratt, Senior Marketing Director of Veeco Advanced Deposition & Etch. “As the leading manufacturer of production-proven ion beam technology equipment, we continue to earn the trust of our customers with focused R&D and products to solve their technical and commercial challenges.”
About Veeco Ion Beam Etch Technology
Veeco’s NEXUS IBE systems perform ion-based “milling” of a variety of materials. Veeco has shipped over 300 ion beam etch modules for production use, making it the world’s leader in production-optimized ion beam etch technology. Veeco supports low-cost manufacturing usage with long-life solutions and a full-service refurbishment program for consumable parts.
Veeco’s process equipment solutions enable the manufacture of LEDs, flexible OLED displays, power electronics, hard drives, MEMS and wireless chips. 我們在 MOCVD、MBE、離子束和其他進階薄膜製程技術市場處於領先地位。我們的優越系統推動了能源效率、消費型電子產品和網絡存儲設備方面的創新，讓我們的客戶可以盡可能提高產率、降低成本。For information on our company, products and worldwide service and support, please visit www.veeco.com.
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